Chemical Vapor Deposition (CVD), coating process involving the deposition of a layer by decomposition of a gaseous compound (e.g. deposition of a metal by thermal decomposition of a volatile compound of the metal). Chemical vapor deposition processes can be supported (PECVD = Plasma Enhanced CVD) or started (PACVD = Plasma Activated CVD) by plasma. Important applications of chemical vapor deposition processes are layers of amorphous carbon or silicon as well as titanium nitride, titanium carbide and silicon nitride layers.
Plasma Applications
Limitless surfaces modifications: Overview Plasma Applications, Plastic Bonding, Medical, Electronics and Semiconductor, Industrial, Plasma Cleaning, Plasma Etching, Plasma Activation, Plasma Coating and Reactive Ion Etcher RIE
Plasma Services
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