Plasma Knowledge

Oxygen Plasma Etching

 
Plasma etching can remove layers of materials in order to create micro designs on the surface, but in order to make the designed patterns an etching mask is placed on the surface to be used like a stencil for the plasma. The plasma will not etch out the material below the mask. Some etching masks are made of organic material and are called photoresists. After etching, these masks need to be removed and that process is called oxygen plasma etching or plasma ashing. Oxygen plasma etching is a necessary step in the production of silicon wafers used in the fabrication of integrated circuits.

How Oxygen Plasma Etching is Accomplished

 
Oxygen plasma etching is done using low-pressure plasma systems. Oxygen is used as the precursor gas and is channeled into the vacuum chamber with the wafer. Then, high power radio waves are applied in the chamber and this, along with the low pressure of the vacuum chamber, causes the oxygen molecules to ionize, forming plasma. The oxygen plasma etches the photoresist by turning it into ash. The ash is then removed through the vacuum pump. This is why oxygen plasma etching is usually referred to as ashing.
 
A Plasma System to Suit Each Application & Advantages of Plasma-enhanced Chemical Vapor Deposition (PECVD)Adhesion Science & Adhesion TreatmentsAnisotropic Etching & The Methods and Uses for Anisotropic EtchingApplications of a Plasma Asher & Surface ModificationArgon Plasma & Argon Plasma Role in Micro-SandblastingAtmospheric Pressure Plasma & Applications of Atmospheric Pressure PlasmaBonding Polyethylene & Using Plasma for Bonding PolyethyleneCoating PVD & Advantages and Disadvantages of Coating PVDContact Angle Measurements & How to Measure Contact AnglesCorona Discharge & The Properties of Corona DischargesCorona Treatment & The Differences between Corona Treatment and Atmospheric PlasmaCVD & Plasma Enhanced CVDDifferences between the Types of Plasma Treatments, Specifically Plasma Coating & Plasma Treatments IntroductionDry Etching & Dry Etching vs. Wet EtchingDry Etching (Plasma Etching) and Wet Etching & Advantages and Disadvantages of Dry Etching (Plasma Etching) and Wet EtchingDyne Levels & Determining a Dyne Level Using a Dyne TestDyne Testing & More about Dyne TestingEtching Silicon & How Etching Silicon is DoneEvaporated Coatings & Methods of Applying Evaporated CoatingsHF Etching & Buffered HF EtchingHistory of Plasma Treatment & Why Powder Plasma Treatment?How to Measure Surface Tension & More Methods of Measuring Surface TensionHydrogen H2 Plasma & Oxide-Layer Reduction with Hydrogen PlasmaHydrogen Peroxide Plasma & The Advantages and Uses of Hydrogen Peroxide Plasma SterilizationHydrophilic Treatment & How Hydrophilic Treatment WorksHydrophobic Coatings vs. Hydrophilic Coatings & Uses for Hydrophobic CoatingsInductive Plasma & The Application of Inductive PlasmaIndustries That a Plasma Asher is Used In & Plasma Etch Customer Parts (Plastic, Metal, Glass)Intelligent Textiles & The Possible Applications of Intelligent TextilesIsotropic Etching & Wet Isotropic Etching vs. Dry Isotropic EtchingLength of Activation for Plasma Treatments & Plasma Treatments and Types of Plasma CoatingLow Pressure Plasma Systems & Types of Low Pressure Plasma SystemsMaximizing Coating Adhesion & Applications of Improving Coating AdhesionNanotechnology Fabrics & Nanotechnology Fabric ProcessesNitrogen Plasma & Nitrogen Plasma vs. Oxygen PlasmaOleophobic Coating & Oleophobic Coating Plasma TreatmentOxide Etch & Buffered Oxide Etch vs. Plasma EtchOxygen Plasma Etching & How Oxygen Plasma Etching is AccomplishedPECVD Industrial Applications & PECVD EfficiencyPECVD Is an Improved Method of Chemical Vapor Deposition & Operation of PECVD SystemsPhysical Vapor Deposition & Physical Vapor Deposition ApplicationsPlasma Applications & Plasma applications in Surface ModificationPlasma Asher & How is Plasma Ashing Done?Plasma Asher Tailored to the Customer & Plasma Etchers and SelectivityPlasma Beam & Plasma Beam ApplicationsPlasma Bonding & The Techniques for Plasma BondingPlasma Etching Tailored to the Customer & Plasma Etcher ParametersPlasma Frequency & Ranges of Plasma FrequencyPlasma Gas & Plasma Gas (Partially Ionized Gas) – Degree of IonizationPlasma Generator & Types of Plasma GeneratorsPlasma Surface Modification & Plasma Surface SciencePlasma Surface Technology & Surface Technology CapabilitiesPlasma Treatment of Different Materials & Plasma Treatment of Silica PowderPlasma Treatment of Powder Applications & Experienced Powder TreatmentPlasma Treatment of Textiles & Plasma Treatment of Textiles: Medical and Technological ApplicationsPlasma Treatment Services & The Use of Corona and Plasma Treatment to Modify Contact AnglePlasma Treatment Systems & Plasma TreaterPlasma Treatments and the History of Plasma & Plasma Treat Different MaterialsPowder Treatment for the Customer & Industries that Need Powder TreatmentSteps of Dry Etching (Plasma Etching) and Wet Etching & Dyne Levels and Plasma Etching TechnologiesSurface Coating with PECVD System & Applications of PECVD SystemsSurface Treatments & Uses for Surface TreatmentsThierry Plasma Systems & What is Plasma-enhanced chemical vapor deposition (PECVD)?What Industries Plasma Etching Is Used In & Plasma Etching MechanismsWhat is a Plasma Asher? & Differences between Plasma Etch and Plasma AshWhat is Plasma Density? & Plasma Density: Cold and Hot PlasmaWhat is Plasma Treatment? & Plasma Treatment of Powders

Contact form light

Contact Request
*required
**required if you want a callback