---
title: Reactive Ion Etching (RIE)
description: Reactive Ion Etching (RIE) is used in the semiconductor industry to remove material from wafers. Thierry offers RIE systems for the semiconductor industry.
---

[Plasma Knowledge Base ](https://www.thierry-corp.com/plasma-knowledgebase)

# [Reactive Ion Etching (RIE)](https://www.thierry-corp.com/plasma-knowledgebase/reactive-ion-etching-rie)

 Written by [George Osenga](https://www.thierry-corp.com/plasma-knowledgebase/author/george-osenga) | Aug 17, 2021 7:14:50 PM

RIE stands for [reactive ion etching](https://www.thierry-corp.com/reactive-ion-etching-rie?hsLang=en). This is a form of contacting substrates using a high frequency switched electrode. Reactive ion etching is most often used in the continuous reduction of integrated circuits. This process can be achieved by using a Diener low pressure plasma system.

To learn more about etching, check out our eBook titled "[Plasma Etching and Cleaning Strategy for Better Product Quality](https://www.thierry-corp.com/plasma-etching-and-cleaning-strategy-for-better-product-quality?hsLang=en)."

<https://www.thierry-corp.com/plasma-etching-and-cleaning-strategy-for-better-product-quality?hsLang=en>

[View full post](https://www.thierry-corp.com/plasma-knowledgebase/reactive-ion-etching-rie)

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