Reactive Ion Etching (RIE) is used in the semiconductor industry to remove material from wafers. Thierry offers RIE systems for the semiconductor industry.
RIE stands for reactive ion etching. This is a form of contacting substrates using a high frequency switched electrode. Reactive ion etching is most often used in the continuous reduction of integrated circuits. This process can be achieved by using a Diener low pressure plasma system.
To learn more about etching, check out our eBook titled "Plasma Etching and Cleaning Strategy for Better Product Quality."
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