Plasma enhanced chemical vapor deposition (PECVD) for the purpose of applying a low friction coating is a common application of plasma coating technology. The requirement of changing the surface energy of an elastomeric seal, O-ring or component that has a tacky surface in order to ease assembly or enable vibratory bowl feeding is often applied in industry.
The process of applying a low friction coating is performed in a low pressure plasma system. This process can be performed on a tray of flat parts or bulk in a basket or canister tumbled parts. The batch process is first plasma cleaned and activated to ensure the coating has a clean, active surface to bond to. Then the batch of parts are exposed to a plasma process to apply the desired process chemistry required to coat the low friction material of choice without breaking vacuum. These coatings can be from a range of PTFE like materials. SiO2 like materials or carbon or enhanced carbon coatings. Optimization of surface for low friction applications has a great deal of options for consideration.
The transportation industry has a number of applications where elastomeric seals are used in a wide range of products. The seals used in these applications are often assembled in a method that can damage the seal during assembly. This damage is caused by abrasion, pinching and nicking. Having a low friction coating on the surface of the elastomer during this assembly process is a great way to minimize and manage this damage.
High volume automated assembly is a common practice in many industries today. The process of placing an O-ring in a manufactured part in a precise location accurately and fast can be a great challenge. one of the key issues is to feed an O-ring from a bulk package to an automated assembly is a challenge. This challenge is due to the exterior surface of the O-rings being tacky. By coating the O-rings in bulk with a low friction coating the O-rings can be bulk fed in a vibratory bowl feeding method.
Control Cabinet:
W 310 mm H 330 mm D 420 mm
Chamber:
Ø 3.9 in, L 10.9 in
Chamber Volume:
2
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
Touch Screen
Control Cabinet:
W 600 mm H 1700 mm D 800 mm
Chamber:
Ø 3.9 in, L 10.9 in
Chamber Volume:
2
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Control Cabinet:
W 560 mm H 600 mm D 420 mm
Chamber:
Ø 5.9 in, L 12.6 in
Chamber Volume:
5
Gas Supply:
2 gas channel via needle valve
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
Semi-Automatic
Control Cabinet:
W 600 mm H 2100 mm D 800 mm
Chamber:
W 15.8" x H 23.6" x D 24.6"
Chamber Volume:
150
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
Touch Screen
Control Cabinet:
W 600 mm H 1700 mm D 800 mm
Chamber Volume:
120
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC
Control Cabinet:
W 600 mm H 2100 mm D 800 mm
Chamber Volume:
600
Gas Supply:
Mass flow controllers
Generator:
1 pc. with 40 kHz
(optional: 13.56 MHz or 2.45 GHz)
Control:
PC