Plasma Coating

Plasma coating technology allows manufacturers to

achieve reliable and uniform application of coatings.

Plasma coating or plasma-enhanced chemical vapor deposition (PECVD) uses plasma to modify the properties of material surfaces to produce a surface that will uniformly receive a coating.

Plasma coating applies ultra-thin layers of individual molecular groups or monomers to objects and material surfaces.

This innovative plasma coating process enables superior bond performance of coatings such as:

• Hydrophobic
• Hydrophilic
• Scratch-resistant
• Functionalized coatings
• Anti-corrosion
• Many more

PECVD is used to produce a coating that permanently changes surface energy in materials, apply low friction coatings, or coat a material to enhance the performance or properties of materials.

Functional Principles of Plasma Coating

For low pressure plasma coating, a vapor of liquid or gaseous monomer is introduced into the plasma chamber. This gas or vapor from the process is molecularly bonded with the help of plasma. This coating is applied in the range of 10 angstroms to microns, depending on the process parameters.

For coating by an atmospheric plasma process, the gaseous monomers are introduced directly into the plasma jet by means of a carrier gas. Therefore, the plasma focuses on the monomer on the surface and polymerizes it.