Plasma Enhanced Chemical Vapor Deposition | Thierry Plasma

Chemical Vapor Deposition

PECVD is a coating process that Thierry provides consultation and plasma coating solutions for your temperature sensitive products.

Chemical vapor deposition is a plasma coating process that Thierry can perform using its low-pressure  plasma systemsChemical vapor deposition (CVD) is capable of depositing extremely thin layers onto surfaces. This is achieved by heating the surface to a high temperature before a monomer is channeled into the chamber. The monomer then leaves a small coat of whatever material the manufacturer wishes to use.  CVD is used within the field of semiconductors to produce very thin films or coatings on the surfaces. Often surfaces are coated with layers of carbon, silicon, carbon nanotubes, silicon carbide, silicon nitride.  CVD can also be used to produce synthetic diamonds.

Plasma Enhanced CVD

Plasma enhanced chemical vapor deposition (PECVD) is a superior form of  CVD. In this process plasma is used to accelerate the  process of coating surfaces. Thierry’s  plasma coaters are capable of performing  CVD relatively easily and it does not require the object being treated to undergo as much thermal stress.

To learn more about the use of plasma in manufacturing, please read our eBook titled "Manufacturer’s Surface Activation Guide for Improved Adhesion."


New call-to-action