Plasma Frequency

 
Plasma generators can operate at different plasma frequencies. Plasma frequency determines how the plasma ions behave. When plasma systems run on a lower plasma frequency they create longer wavelengths which give ions a large amount of kinetic energy. With a lower plasma frequency there is a higher ion density. This means there will be more plasma particles per unit of area. With a higher plasma frequency there is a shorter wavelength which results in faster etching but it requires more energy to operate.

Ranges of Plasma Frequency

 
There are three ranges of plasma frequency most commonly used in Thierry’s plasma technology systems. They are 40 kHz, 13.56 MHz, and 2.45 GHz. 40 kHz plasma frequency is mostly used for plasma cleaning or desmearing but can be used for etching as well, yet it takes longer. Normally, plasma etching uses 13.56 MHz plasma frequency which is faster and is the world wide standard. 2.45 GHz plasma frequency is used for even faster etching and it is the most effective for promoting chemical reactions while conducting reactive plasma etching.
 
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